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Thin Solid Films

From Wikipedia, the free encyclopedia
Thin Solid Films
DisciplineThin-film synthesis, applied physics
LanguageEnglish
Edited byJ. E. Greene
Publication details
Former name(s)
Symposium on Plasma Science for Materials
History1967–present
Publisher
FrequencyBiweekly
2.183 (2020)
Standard abbreviations
ISO 4Thin Solid Films
Indexing
CODENTHSFAP
ISSN0040-6090
LCCN81005059
OCLC no.1605925
Links

Thin Solid Films is a peer-reviewed scientific journal published 24 times per year by Elsevier. It was established in July 1967. The current editor-in-chief is J. E. Greene (University of Illinois at Urbana–Champaign).

Aims and scope

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The journal covers research on thin-film synthesis, characterization, and applications, including synthesis, surfaces, interfaces, colloidal behavior, metallurgical topics, mechanics (including nanomechanics), electronics, optics, optoelectronics, magnetics, magneto-optics, and superconductivity.

Abstracting and indexing

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The journal is indexed and abstracted in:

According to the Journal Citation Reports, the journal has a 2020 impact factor of 2.183.[1]

References

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  1. ^ "Thin Solid Films". 2020 Journal Citation Reports. Web of Science (Science ed.). Thomson Reuters. 2021.
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