Did you know that it’s been more than 20 years since ASML shipped its first extreme ultraviolet (EUV) lithography system? EUV is already used to manufacture today's advanced chips, and High NA EUV is poised to enable the next generation. But before any of that, there were the Alpha Demo Tools. These prototypes were critical for collaborating with industry partners to further develop EUV and ready it for commercialization. Together, we pushed technology to new limits, and the results are all around us – maybe even in the device you're using to read this post.
Hako Botma
1w
Great times in the Flight forum, building 21. Worked with the smartest people to realize a dream. Did Illumination at the time, specifically Slit Uniformity. So proud that my UNIformity COrrection Module, UNICOM, was working in vacuum with 25 actuated 'Luxaflex-like' attenuators.
Hans Meiling
1w
Those were the days! Besides having a great team and great team spirit, it was a privilige to be there from the beginning. And look where EUV litho technology is now: in full production at several major customers!!
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EUV light in a natural form doesn't exist on Earth and was considered to be impossible by many ... Like immersion lithography, one of ASML's great examples to set visionary targets ..., making 'the impossible possible' ...
This is need to hour to go time to market in faster space and availability of such a unique system for lithography machine, indeed this prototypes machine will help greater extent and inspiring engineering development
Tarun Bansal
1w
EUV journey shows "Nothing is Impossible"
Impressive growth!
Tim Tsarfati
1w
Yes, I remember it well, while doing my PhD research on the protective EUV multilayer optics capping layer at then still FOM Rijnhuizen, in close collaboration with Zeiss SMT. As a fundamental research institute, we even made several of the optics going into the systems, a perfect example of research valorization!
Gi-Bo Choi
1w
Well done! Thanks to early contributors.
Vice President & Master Innovator. Global Tapeout and Mask Operations, GlobalFoundries.
1wTime flies but progress never stops. Like to give credit to Motorola SPS, Intel, AMD and national labs to create EUV LLC for a pre competitive R&D in 1997-98 with one goal to succeed. Whether it was alpha demo tool, defect free multilayer , mask patterning development on 6 in wafers, developing mask blank standard, resist needs , kicking of first pellicle workshop at SPIE and more. And eventually ASML commitment taking us where we are today!! Success story and very fortunate to be part of this early journey driving mask patterning thrust at Motorola . Thanks to each and every individual who touched the EUVL project at its early days .