Richard Schultz

Retired from AMD

Fort Collins, Colorado, United States Contact Info
77 followers 72 connections

Join to view profile

About

Leader of the AMD Corporate Wide Technology Funnel, System Technology Co Optimization (STCO) team and future Advanced Foundry Technology Nodes. Research and recommend new disruptive technologies for "More than Moore's Law" future technologies to meet the 5+ year AMD product roadmap.

Owner and driver of key AMD design requirements for the development of advanced process foundry technology nodes for 1nm and beyond. Key contributor and member of many AMD teams including Foundry Technology Strategy team, Long Range Manufacturing Lead engineer for logic library IP architectures with a 5+ year horizon and new CAD tool innovations for advanced technologies with 5+ year timeline.

Primary interface between AMD design architects and process technology and consultant to AMD senior executive staff of future technology nodes and disruptive technologies.

Core Competencies:
Advanced Process Technology R&D
Foundry Technology Assessment
Device Physics
Trigate and Gate All Around Transistor Device
Standard Cell Architectures ( Vertical Gate All Around FET, Lateral Gate All Around FET, CFET)
Advanced Logic Routing Studies and CAD Tool Enhancements/Innovation
Design for Performance
Design for Yield
Technology Test Chip and Qualification Schedules
Yield and Reliability Vehicle Design
Lithography - Immersion and EUV
CMP Modeling
Performance/Power/Cost/Area
Process Wafer Cost Model Development
Yield Modeling
Failure Analysis
Statistical Timing Analysis and Tool Development
On Die Power Droop and Electromigration Tool Development and Simulation
2.1, 2.5 and 3D Packaging Technologies and Die Stacking

Experience

  • Currently Retired from the Industry

    No Longer Employed

    - Present 1 year 4 months

  • AMD

    AMD

    15 years 6 months

    • AMD Graphic

      Senior Fellow, Advanced Technology R&D

      AMD

      - 4 years 11 months

      Fort Collins, Colorado Area

      Lead the Corporate Wide Technology Funnel and Foundry Technology Funnel, Process Technology Research Engagement lead for technologies with a 5+ year timeline. Created and lead several System Technology Co Optimization (STCO) efforts within AMD with a 5+ year time line. Develop advanced node library architectures beyond existing Foundry nodes including backside power delivery architectures. Lead several process technology external R&D engagements beyond foundry technology nodes. Lead IP…

      Lead the Corporate Wide Technology Funnel and Foundry Technology Funnel, Process Technology Research Engagement lead for technologies with a 5+ year timeline. Created and lead several System Technology Co Optimization (STCO) efforts within AMD with a 5+ year time line. Develop advanced node library architectures beyond existing Foundry nodes including backside power delivery architectures. Lead several process technology external R&D engagements beyond foundry technology nodes. Lead IP architect for future High NA EUV lithography targeted technology nodes.

    • AMD Graphic

      Fellow, Advanced Technology R&D

      AMD

      - 10 years 8 months

      Fort Collins, Colorado Area

      Lead the AMD Corporate Wide Technology Funnel for new disruptive technologies and Advanced Technology Council to drive "More than Moore's Law" scaling. Assess foundry technology offerings for 5nm and 3nm and develop requirements to meet AMD future product roadmaps and CAD tools for logic routing for performance, area and yield. Deliver frequent readouts and recommendations to CEO, CTO and other Senior AMD management to help drive AMD's 3-10 year technology horizon and AMD product roadmap.…

      Lead the AMD Corporate Wide Technology Funnel for new disruptive technologies and Advanced Technology Council to drive "More than Moore's Law" scaling. Assess foundry technology offerings for 5nm and 3nm and develop requirements to meet AMD future product roadmaps and CAD tools for logic routing for performance, area and yield. Deliver frequent readouts and recommendations to CEO, CTO and other Senior AMD management to help drive AMD's 3-10 year technology horizon and AMD product roadmap. Actively participate in the Manufacturing Long Term Strategy team and Foundry Technology Operations team. Successfully developed and transferred to production prior technologies spanning 45nm...7nm.

  • LSI, an Avago Technologies Company Graphic

    Distinguished Engineer - Highest Technical Honor

    LSI, an Avago Technologies Company

    - 17 years 5 months

    Fort Collins, Colorado Area

    Lead the DEPCIT process for making changes to design methodologies accross the company. Other responsibilities included timing methodology, advanced modeling, yield engineering, design for manufacturing lead which included (critical area yield modeling, litho simulation, chemical mechanical polish simulation and tool qualification), dynamic voltage drop CAD tool software development, static timing risk analysis CAD tool software development and product engineering.

Education

Publications

  • 2012 VLSI Symposium - Designing in Scaled Technologies: 32nm and Beyond

    -

  • FSA Forum Magazine – Vol. 14 Number 1, March 2007 – Industry Reflections Interview on Fabless Model and DFM

    -

  • LSI World Wide Technical Conference 2006 - Critical Area Analysis and Mitigation Strategies in Deep Submicron Technologies

    -

Patents

  • Apparatuses and Systems for Offset Cross Field-Effect Transistors

    US 20240145565

  • Auto Cone Logic Schematic And Waveform Generation Tool

    US 6,625,770

  • CAD Flow for 15nm/22nm Multiple Fine Grained Wimpy Gate Lengths in SIT Gate Flow

    US 8,099,686 b2

  • CAD flow for 15nm/22nm multiple fine grained wimpy gate lengths in SIT gate flow

    US 8,099,686

  • Channel Length Scaling for Footprint Compatible Digital Library Cell Design

    US 8,397,184

  • Chip level clock tree deskew circuit

    US 7,023,252

  • Concentric Metal Density Power Routing

    US 6,476,497

  • Cross FET SRAM Cell Layout

    US 11,778,803

  • Cross Field Effect Transistor (XFET) Library Architecture Power Routing

    US 11,881,393

  • Cross Field Effect Transistor Library Cell Architecture Design

    US 11,882,673

  • Defect analysis using a yield vehicle

    US 7,284,213

  • Device for Avoiding Timing Violations Resulting from Process Defects in a Backfilled Metal Layer of an Integrated Circuit

    US 7,392,496

  • Double Spacer Immersion Lithography Triple Patterning Flow and Method

    US 10,304,728

  • Dual-track Bitline Scheme for 6T SRAM cells

    US 11,710,698

  • Failure Analysis Vehicle for Yield Enhancement with Self Test at Speed Burnin Capability for Reliability Testing

    US 7,420,229

  • Failure Analysis Vehicle for Yield and Qualification of 90nm Technologies and Beyond

    US 6,781,151

  • Failure analysis vehicle for yield enhancement with self test at speed burnin capability for reliability testing Failure analysis vehicle for yield enhancement with self test at speed burnin capability for reliability testing

    US 7,129,101

  • Floor Plan-based Power Bus Analysis and Design Tool for Integrated Circuits

    US 6,675,139

  • Floor plan development electromigration and voltage drop analysis tool

    US 7,016,794

  • Folded cell layout for 6T SRAM cell

    US 11,437,316

  • Fully shielded capacitor cell structure

    US 7,154,734

  • Gate All Around Architecture With Local Oxide

    US 9704995

  • Gate All Around Device Architecture With Hybrid Wafer Bond Technique

    US 10068794

  • Gate Contact Over Active Region in Cell

    US 10,818,762

  • Gate Contact Over Active Region in Cell

    US 11,424,336

  • Inset Power Post and Strap Architecture with Reduced Voltage Droop

    US 11,652,050

  • Instantaneous Voltage Drop Sensitivity Analysis Tool (IVDSAT)

    US 7,818,157

  • Interconnect Integrity Verification

    US 7,424,690

  • Load Sensing, Slew Rate Shaping, Output Signal Pad Cell Driver Circuit And Method

    US 6,388,486

  • Metahardened Flip Flop Architecture

    US 5,999,029

  • Metal Density Distribution for Double Pattern Lithography

    US 10,283,437

  • Metal Zero Contact Via Redundancy on Output Nodes and Inset Power Rail Architecture

    US 10,438,937

  • Metal Zero Power Ground Stub Route to Reduce Cell Area and Improve Cell Placement at the Chip Level

    US 11,120,190

  • Metal zero contact via redundancy on output nodes and inset power rail architecture

    US 10,651,164

  • Metastability Risk Simulation Analysis Tool and Method

    US 6,408,265

  • Method of Automatically Generating Schematic and Waveform Diagrams for Analysis of Timing Margins and Signal Skews of Relevant Logic Cells using Input Signal

    US 6,442,741

  • Method of Automatically Generating Schmatic and Waveform Diagrams for Isolating Faults From Multiple Failing Paths in a Circuit Using Input Signal Predicators and TransitionTime

    US 6,671,846

  • Method of Generating A Redistribution Metal Power Bus Pattern For A Wire Bonded Integrated Circuit

    US 6,653,726

  • Method of Using of Multiple Single Damascene Steps to Build a Thicker Redistribution Layer

    US 6,830,984

  • Method of creating photlithographic masks for semiconductor device features with reduced design rule violations

    US 8,219,939

  • Methods for fabricating FinFET structures having different channel lengths

    US 7,687,339

  • Methods for fabricating FinFET structures having different channel lengths

    US 7,829,466

  • Methods for fabricating FinFET structures having different channel lengths

    US 7,960,287

  • N Cell Height Decoupling Circuit

    US 7,829,973

  • Oscillating Capacitor Architecture in Polysilicon for Improved Capacitance

    US 10,608,076

  • Power Grid Architecture and Optimization with EUV Lithography

    US 11,347,925

  • Power Grid Layout Designs for Integrated Circuits

    US 11,189,569

  • Process for Forming Fins for a FinFET device

    US 8,624,320

  • Process, Voltage and Temperature Independent Clock Tree Deskew Circuitry

    US 6,340,905

  • Process, Voltage and Temperature Independent Clock Tree Deskew Circuitry - Active Drive Method

    US 6,433,598

  • Process, Voltage and Temperature Independent Clock Tree Deskew Circuitry - Temporary Driver Method

    US 6,653,883

  • Process, Voltage and Temperature Independent Clock Tree Deskew Circuitry - Temporary Driver Method

    US 6,429,714

  • Radially Increasing Density, Core Power Bus Architecture for a Copper Process

    US 6,346,721

  • Radially-Increasing Core Power Bus Grid Architecture

    US 6,111,310

  • Reliability circuit for applying an AC stress signal or DC measurement to a transistor device

    US 7,183,791

  • Routing and manufacturing with a minimum area metal structure

    US 11934764

  • SRAM Bit Cell with Self-aligned Bidirectional Local Interconnects

    US 8,076,236

  • SRAM bit cell with self-aligned bidirectional local interconnects

    US 8,076,236

  • Selective local interconnect to gate in a self aligned local interconnect process

    US 8,563,425

  • Self-aligned Trench Contact and Local Interconnect With Replacement Gate Process

    US 8,564,030

  • Self-timed reliability and yield vehicle array

    US 6,861,864

  • Self-timed reliability and yield vehicle with gated data and clock

    US 7,308,627

  • Semiconductor Chip with Stacked Conductor Line and Air Gaps

    US 11,004,791

  • Semiconductor device fabrication using multiple expeosure and block mask approach to reduce design rule violations

    US 8,304,172

  • Sinusoidal Shaped Capacitor Architecture in Oxide

    US 10,756,164

  • Standard Cell Layout Architectures and Drawing Styles for 5nm and Beyond

    US 11,211,330

  • Standard Cell and Power Grid Architectures with EUV Lithography

    US 10,796,061

  • Static Timing Analysis and Performance Diagnostic Display Tool

    US 6,851,098

  • Static timing and risk analysis tool

    US 7,181,713

  • Test Vehicle Data Analysis

    US 7,370,257

  • Trench Silicide and Gate Open with Local Interconnect with Replacement Gate Process

    US 8,716,124

  • Trench silicide and gate open with local interconnect with replacement gate process

    US 9,006,834

  • Turning Off Clocks to Flip Flops

    US 8,347,123

  • Turning Off Clocks to Flip Flops

    US 7,631,209

  • Vertical Gate All Around Library Architecture

    US 10,186,510

Projects

  • Long Range Manufacturting Stategic Committee

    Active member of the long range strategic committee for process foundry and OSAT engagement for AMD's mid and long range manfacturing roadmap. Help drive key alignment and focuses on strategic long term goals to anticipate and align AMD's future technology and product needs and external suppliers.

  • Advanced Technology Council

    -

    Lead the effort to respond to slowing process technology performance and increased cost/compexity to keep AMD products moving forward in a "More than Moore's Law" enviroment. Drive key interactions between CPU and GPU design architects, blending design architecture, advanced technology and disruptive technologies into more competitve AMD future roadmap.

  • AMD Corporate Wide Technology Funnel

    -

    Owner and leader of the AMD Corporate Wide Technology Funnel. Have successfully moved several disruptive technologies through the AMD Technology Funnel and into the long terms AMD roadmap. The main focus is to deliver "More than Moore's Law" scaling, cost and performance as advanced process technology slows down goinf forward.

  • AMD Executive Reviews, Mentoring and Team Participation

    -

    Prepare and review the status of each foundry through regular Foundry meetings and Quarterly Reviews. Meet with CTO and other senior executive staff at each Foundry and within AMD. Have successfully managed and delivered up to three advanced Foundry nodes simultaneously.

    Participate in many design and technology cross functional teams. Mentor less experienced engineers and transfer the technology ownership to them as it moves from R&D to test chip and product tape out readiness…

    Prepare and review the status of each foundry through regular Foundry meetings and Quarterly Reviews. Meet with CTO and other senior executive staff at each Foundry and within AMD. Have successfully managed and delivered up to three advanced Foundry nodes simultaneously.

    Participate in many design and technology cross functional teams. Mentor less experienced engineers and transfer the technology ownership to them as it moves from R&D to test chip and product tape out readiness maturity.

    Teams Leadership Roles Include:

    Advanced Corporate Wide Technology Funnel
    Advanced Technology Council
    New Standard Cell Architectures
    Quarterly Foundry Reviews
    Weekly AMD Internal Design and Technology Interlocks
    Regular Foundry Technical Exchange
    Yearly Summary of Conferences - IEDM...other
    Future Process Roadmap Executive Updates

    Team Participation Roles Include:

    SEO Strategy Team
    FTO Strategy Team
    Performance/Power/Cost Tiger Team
    Node Owners Best Practices
    AMD Test Chip and Shuttle Planning
    Design for Manufacturability
    Paper Submission Reviews for IEDM, VLSI
    Process Technology Competitive Analysis

  • AMD Future Foundry Technology R&D

    -

    Collaborate with leading edge Foundries to define and develop early requirements for future process technology offerings that meet AMD's 3-5 year product roadmap. Owner of all aspects of the technology which include cost reduction, scaling, performance, power, reliability, schedule and AMD product or technology component requirements to be enabled for future products. Past delivered technologies have spanned 45nm-7nm.

  • Design For Manufacturing Tool Flow and Qualification Lead

    -

    Lead Engineer for the tool qualification and analysis of lithography simulations, chemical mechanical polish simulations and critical area analysis simulations associated with external Foundry Process Technology. Responsible for model to silicon correlation at the cell level and chip level.

  • Dynamic Power Droop CAD Tool Develoment and Deployment

    -

    Developed and successfully deployed a power droop sensitivity analysis tool with a graphical layout interface which could model dynamic power mesh droop based on various voltage dependent injected current wave shapes and magnitude by power zone or area on the power mesh. It could output max droop over time or a full dynamic video of the simulation results. The tool was written in Perl5 and Perl Tk.

  • Former Si2 and FSA Panel Member for DFM and Models

    -

    Participated and contributed to working groups within FSA and Si2 on design for manufacturability with focus on areas such as lithography and chemical mechanical polish modeling and methodology.

  • New Standard Cell Architectures

    -

    Key architect for the design and development new standard cell architectures to improve scaling and routability of advanced process technology nodes to provide hyper scaling and improved cost, power, power droop and reliability. Implemented new architectures to several AMD technology nodes that enabled true AMD hyper scaling. Several hundred million dollar ROI savings expected over technology lifetime. Proposed new architectures for future nodes for improved cell placment utilization, power…

    Key architect for the design and development new standard cell architectures to improve scaling and routability of advanced process technology nodes to provide hyper scaling and improved cost, power, power droop and reliability. Implemented new architectures to several AMD technology nodes that enabled true AMD hyper scaling. Several hundred million dollar ROI savings expected over technology lifetime. Proposed new architectures for future nodes for improved cell placment utilization, power drop and EM performance and taking full advantage of EUV patterning.

  • Static Timing Risk Analysis Tool Development

    -

    Developed a tool and graphical interface that could pull in multi-corner static timing simulation results and analyze or graph set up or hold timing risk based on margin and movement across multiple timing corners. It was written in Perl5 and Perl Tk.

  • Yield and Qualification Test Chip Vehicle Design

    -

    Designed and taped out several yield tile vehicles. Developed a front end of line and middle of line based vehicle which included tile based process module variants with emission and voltage contrast diagnostic capability and rapid fault isolation. Also developed a tile based back end of line vehicle which included bit map capability, rapid voltage contrast diagnosis and focused ion beam isolation capability. Also was the lead top level designer of a mixed signal qualification vehicle.

Honors & Awards

  • 2 Corporate Values Awards in 2006

    -

  • 12 Employee Excellence Awards Throughout Career

    -

  • 2006 FSA Fabless Semiconductor Award - DFM Hard Work and Excellence Achievement Award

    -

  • Employee retention programs

    -

    Received key technical staff stay put retention incentives on 3 separate occasions thoughout 27 year career.

  • Inventor of the Year Award in 2002

    -

  • Inventor of the Year Award in 2006

    -

  • Winners Circle Award in 2005

    -

View Richard’s full profile

  • See who you know in common
  • Get introduced
  • Contact Richard directly
Join to view full profile

Other similar profiles

Explore collaborative articles

We’re unlocking community knowledge in a new way. Experts add insights directly into each article, started with the help of AI.

Explore More

Others named Richard Schultz in United States

Add new skills with these courses