ELEMENT 3-5 GmbH

looking forward to meeting you at the HTVD to presenting the disruptive green epitaxy technology - Next Level Epitaxy

wir möchten uns herzlich bei Ihnen für die Aufnahme als Mitglied in Ihrem Verein bedanken. Es ist uns eine große Ehre, Teil einer so angesehenen Organisation in Plasmaphysik für dünne Schichten wie dem EFDS e.V. zu sein. Vielen Dank für das entgegengebrachte Vertrauen und die herzliche Aufnahme in Ihrer Gemeinschaft. Wir sind überzeugt, dass wir gemeinsam mit anderen Mitgliedern viel erreichen können und freuen uns auf eine erfolgreiche Zusammenarbeit.

ELEMENT 3-5 GmbH to Showcase Innovation at High Tech Venture Days in Washington, DC As a testament to its pioneering spirit and commitment to technological advancement, ELEMENT 3-5 GmbH has been selected to pitch at the prestigious High-Tech Venture Days in Washington, DC, taking place on May 7 and 8, 2024. This prestigious opportunity underscores the company's position as a leading innovator in the high-tech landscape and underscores its disruptive potential to have a lasting impact on the future of a wide range of industries. As a prominent player in the tech scene, ELEMENT 3-5 GmbH has attracted attention with its groundbreaking solutions and forward-looking approach in the field of compound semiconductors. The company specializes in novel epitaxy systems and processes that are fundamentally changing manufacturing in the high-power electronics, display, energy and telecommunications industries. In addition to a significant cost reduction, it is above all improved performance and completely new product architectures that are made possible by ELEMENT 3-5.  The High Tech Venture Days serve as a premier platform for ELEMENT 3-5 to showcase their innovations, connect with investors, and foster strategic partnerships. Being selected to pitch at this exclusive event is a compelling milestone for ELEMENT 3-5 GmbH, as it provides an invaluable presence and access to key stakeholders in the global tech ecosystem. The company's participation not only reflects its commitment to technological advancement, but also highlights its potential to revolutionize traditional industries and bring about positive change on a global scale with a view to significantly reducing CO2 emissions. For more information, please contact us or visit the website https://lnkd.in/gVwwKumf

ELEMENT 3-5 GmbH to Showcase Innovation at High Tech Venture Days in Washington, DC As a testament to its pioneering spirit and commitment to technological advancement, ELEMENT 3-5 GmbH has been selected to pitch at the prestigious High-Tech Venture Days in Washington, DC, taking place on May 7 and 8, 2024. This prestigious opportunity underscores the company's position as a leading innovator in the high-tech landscape and underscores its disruptive potential to have a lasting impact on the future of a wide range of industries. As a prominent player in the tech scene, ELEMENT 3-5 GmbH has attracted attention with its groundbreaking solutions and forward-looking approach in the field of compound semiconductors. The company specializes in novel epitaxy systems and processes that are fundamentally changing manufacturing in the high-power electronics, display, energy and telecommunications industries. In addition to a significant cost reduction, it is above all improved performance and completely new product architectures that are made possible by ELEMENT 3-5.  The High Tech Venture Days serve as a premier platform for ELEMENT 3-5 to showcase their innovations, connect with investors, and foster strategic partnerships. Being selected to pitch at this exclusive event is a compelling milestone for ELEMENT 3-5 GmbH, as it provides an invaluable presence and access to key stakeholders in the global tech ecosystem. The company's participation not only reflects its commitment to technological advancement, but also highlights its potential to revolutionize traditional industries and bring about positive change on a global scale with a view to significantly reducing CO2 emissions. For more information, please contact us or visit the website https://lnkd.in/gVwwKumf

ELEMENT 3-5 revolutionizes surface cleaning for semiconductor and optical applications and offers Inductively Coupled Plasma module – FONTO HFI. Ten facts for using our FONTO HFI Inductively Coupled Plasma (ICP) module for surface cleaning of substrates: 1. Effective Removal of Contaminants: The FONTO HFI generates a high-density plasma using a wide range of gases that effectively removes organic and inorganic contaminants from the substrate surface, ensuring a clean and pristine surface. 2. Precision Cleaning: The FONTO HFI allows the use of different excitation frequencies, namely 4MHz and 13.56MHz enabling targeted removal of specific contaminants without affecting the substrate material. The cleaning is generally non-destructive to the substrate, making it suitable for delicate materials or devices where maintaining the integrity of the surface is crucial. 3. Versatility in Material and Dimension Compatibility: The FONTO HFI is applicable to a wide range of substrate materials including metals, semiconductors, and glass, making it versatile for various industries. (Wafer-based processes: Homogeneous up to 300mm; Volume-based plasmas: Non-limited larger surfaces and 3D components. The integration of several sources in one tool is possible which allows cleaning of even larger surfaces.) 4. Fast and Efficient: The high plasma density of our FONTO HFI with a wide range of working pressure between 10-4 to 10-2 mbar leads to an efficient cleaning, reduced processing time and increased overall efficiency in production. 5. Reduced Residual Impurities: The source itself requires low energy input and generates little temperature so that the ICP can be tempered between 20 and 150°C.  If customer wants, the substrate itself can be heated up to 450°C in the process to the breakdown and removal of residual impurities, leaving the substrate with minimal contaminants without effecting the source. 6. Minimized Chemical Usage: Gases such as oxygen, hydrogen, nitrogen, argon, and mixtures thereof can be employed to achieve desired cleaning results, whether it involves organic, inorganic, or chemical compounds. Our FONTO HFI requires fewer chemical cleaning agents compared to traditional methods. 7. High Cleanliness:  The FONTO HFI has no electrodes or disruptive materials in the plasma area to meet highest standards for cleanliness and surface quality, making it suitable for applications in electronics, optics, and materials science 8. Consistent Results: The FONTO HFI provides a consistent & reproducible cleaning process, ensuring uniform cleanliness across a wide range of substrate materials. 9. Integration in existing tools: The customized solution allows with the suitable interface to integrate the hardware & software into existing tools of our customers. 10. Production: The FONTO HFI is a proven 24/7 workhorse which offers superior production efficiency. To offer you the right solution, please contact us at info@element3-5.com

ELEMENT 3-5 revolutionizes surface cleaning for semiconductor and optical applications and offers Inductively Coupled Plasma module – FONTO HFI. Ten facts for using our FONTO HFI Inductively Coupled Plasma (ICP) module for surface cleaning of substrates: 1. Effective Removal of Contaminants: The FONTO HFI generates a high-density plasma using a wide range of gases that effectively removes organic and inorganic contaminants from the substrate surface, ensuring a clean and pristine surface. 2. Precision Cleaning: The FONTO HFI allows the use of different excitation frequencies, namely 4MHz and 13.56MHz enabling targeted removal of specific contaminants without affecting the substrate material. The cleaning is generally non-destructive to the substrate, making it suitable for delicate materials or devices where maintaining the integrity of the surface is crucial. 3. Versatility in Material and Dimension Compatibility: The FONTO HFI is applicable to a wide range of substrate materials including metals, semiconductors, and glass, making it versatile for various industries. (Wafer-based processes: Homogeneous up to 300mm; Volume-based plasmas: Non-limited larger surfaces and 3D components. The integration of several sources in one tool is possible which allows cleaning of even larger surfaces.) 4. Fast and Efficient: The high plasma density of our FONTO HFI with a wide range of working pressure between 10-4 to 10-2 mbar leads to an efficient cleaning, reduced processing time and increased overall efficiency in production. 5. Reduced Residual Impurities: The source itself requires low energy input and generates little temperature so that the ICP can be tempered between 20 and 150°C.  If customer wants, the substrate itself can be heated up to 450°C in the process to the breakdown and removal of residual impurities, leaving the substrate with minimal contaminants without effecting the source. 6. Minimized Chemical Usage: Gases such as oxygen, hydrogen, nitrogen, argon, and mixtures thereof can be employed to achieve desired cleaning results, whether it involves organic, inorganic, or chemical compounds. Our FONTO HFI requires fewer chemical cleaning agents compared to traditional methods. 7. High Cleanliness:  The FONTO HFI has no electrodes or disruptive materials in the plasma area to meet highest standards for cleanliness and surface quality, making it suitable for applications in electronics, optics, and materials science 8. Consistent Results: The FONTO HFI provides a consistent & reproducible cleaning process, ensuring uniform cleanliness across a wide range of substrate materials. 9. Integration in existing tools: The customized solution allows with the suitable interface to integrate the hardware & software into existing tools of our customers. 10. Production: The FONTO HFI is a proven 24/7 workhorse which offers superior production efficiency. To offer you the right solution, please contact us at info@element3-5.com

In the beginning of 2024, we are celebrating a major milestone. Recently we tested inhouse our first sold ICP module “FONTO HFI” and the module will be installed at a key customer in Germany. The FONTO HFI is most advanced for selective etching of any materials of the substrate without damaging the surface.   Our ICP module enables to work at wide range of gases, gas flows and mix of gases at a pressure range of 10-2 – to 10-4 mbar and can be applied to RIE, PECVD, ALD and ALE. Interested to learn more?  please contact us at info@element3-5.com

We are delighted to announce that we are now a member of EPIC, this prestigious European community. EPIC (European Photonics Industry Consortium) is the world leading industry association since 20 years that promotes the sustainable development of organizations working in the field of photonics in Europe.  EPIC has a strong network of over 800 companies in 35 countries. EPIC publishes market and technology reports, organizes technical workshops and B2B roundtables, supports EU funding proposals, advocacy and lobbying, education and training activities, standards and roadmaps, pavilions at exhibitions.

For the first time ELEMENT 3—5 exhibited at the Semicon Europa 2023.  We would like to express our sincere gratitude to everyone that stopped by our ELEMENT 3—5 booth at Semicon Europa 2023 in Munich, Germany, including guests, clients, and business partners. We show case to our customers about our new low temperature epitaxy method, the ICP and Ion sources, and our newest mass production epitaxy equipment, the "ACCELERATOR 3500K," for AlN template deposition for GaN manufacturing. We were able to have a lot of fruitful contacts and conversations with you. See you at the Compound Semiconductor in 2024 in Brussels.