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Showing 1–2 of 2 results for author: Schücke, L

  1. arXiv:2407.04441  [pdf, other

    physics.plasm-ph

    Decoupling NO production and UV emission intensity over the E-H mode transition in a low-pressure inductively coupled plasma device

    Authors: Lars Schücke, Angie Natalia Torres Segura, Ihor Korolov, Peter Awakowicz, Andrew R. Gibson

    Abstract: A low-pressure double-inductively coupled plasma device is used to study the fundamental plasma parameters, plasma chemistry, and UV photon emission from the first excited state of nitric oxide, NO(A), in gas mixtures of nitrogen and oxygen. In addition to the gas mixture, rf power and gas pressure are varied, and the E-H mode transition of the inductively coupled plasma is studied specifically. T… ▽ More

    Submitted 5 July, 2024; originally announced July 2024.

  2. arXiv:2307.15545  [pdf, other

    physics.plasm-ph

    Interactions between flow fields induced by surface dielectric barrier discharge arrays

    Authors: Alexander Böddecker, Maximilian Passmann, Sebastian Wilczek, Lars Schücke, Ihor Korolov, Romuald Skoda, Thomas Mussenbrock, Andrew R. Gibson, Peter Awakowicz

    Abstract: This study investigates the flow field induced by a surface dielectric barrier discharge (SDBD) system, known for its efficient pollution remediation of volatile organic compounds (VOCs). We aim to understand the flow dynamics that contribute to the high conversion observed in similar systems. Experimental techniques, including schlieren imaging and particle image velocimetry (PIV), applied with h… ▽ More

    Submitted 28 July, 2023; originally announced July 2023.

    Comments: submitted to Plasma Chemistry and Plasma Processing by Springer Nature